加入 Gitee
与超过 1200万 开发者一起发现、参与优秀开源项目,私有仓库也完全免费 :)
免费加入
克隆/下载
贡献代码
同步代码
取消
提示: 由于 Git 不支持空文件夾,创建文件夹后会生成空的 .keep 文件
Loading...
README
Apache-2.0

SkyWater Open Source PDK

GitHub license - Apache 2.0 Travis Badge - https://travis-ci.org/google/skywater-pdk ReadTheDocs Badge - https://skywater-pdk.rtfd.io Latest GitHub tag (including pre-releases) GitHub commits since latest release (v0.0.0)

The SkyWater Open Source PDK is a collaboration between Google and SkyWater Technology Foundry to provide a fully open source Process Design Kit and related resources, which can be used to create manufacturable designs at SkyWater’s facility.

As of May 2020, this repository is targeting the SKY130 process node. If the SKY130 process node release is successful then in the future more advanced technology nodes may become available.

The SkyWater Open Source PDK documentation can be found at <https://skywater-pdk.rtfd.io>.

Google + SkyWater Logo Image

Current Status -- Experimental Preview

Warning
Google and SkyWater are currently treating the current content as an experimental preview / alpha release.

While the SKY130 process node and the PDK from which this open source release was derived have been used to create many designs that have been successfully manufactured commercially in significant quantities, the open source PDK is not intended to be used for production settings at this current time. It should be usable for doing test chips and initial design verification (but this is not guaranteed).

Google, SkyWater and our partners are currently doing internal validation and test designs, including silicon validation or the released data and plan to publish these results.

The PDK will be tagged with a production version when ready to do production design, see the "Versioning Information" section for a full description of the version numbering scheme.

To get notified about future new releases of the PDK, and other important news, please sign up on the skywater-pdk-announce mailing list [join link].

See both the Known Issues section and the SkyWater PDK GitHub issue list to get more detailed information around currently known issues.

Resources

The latest SkyWater SKY130 PDK design resources can be viewed at the following locations:

SKY130 Process Node

The SKY130 is a mature 180nm-130nm hybrid technology originally developed internally by Cypress Semiconductor before being spun out into SkyWater Technology and made accessible to general industry. SkyWater and Google’s collaboration is now making this technology accessible to everyone!

The SKY130 Process node technology stack consists of;

  • Support for internal 1.8V with 5.0V I/Os (operable at 2.5V)
  • 1 level of local interconnect
  • 5 levels of metal
  • Is inductor-capable
  • Has high sheet rho poly resistor
  • Optional MiM capacitors
  • Includes SONOS shrunken cell
  • Supports 10V regulated supply
  • HV extended-drain NMOS and PMOS

The SKY130 Process Node is an extremely flexible offering, including many normally optional features as standard (features like the local interconnect, SONOS functionality, MiM capacitors, and more). This provides the designer with a wide range of flexibility in design choices.

If your needs extend beyond the standard included functionality in the SKY130 Process Node, please see Contacting SkyWater as they specializes in enabling production volume of process customization include the addition of specialized materials like Nb, Ge, V2O5, Carbon Nanotubes. Google and SkyWater continuing to explore new options to be included in the SkyWater Open Source PDK and SKY130 Process Node that enable new innovative solutions to traditional design problems.

Typical usages of 130nm Process Nodes

The 130nm process was first commercialized around the 2001-2002 time frame and is now primarily used in the area of research, small microcontroller development, and mixed signal embedded designs such as IoT devices.

A living Google document at <https://j.mp/si130nm> has been created to provide inspiration from what researchers, commercial entities and other groups have done with similar sized process nodes. As there are widely different constraints and possibilities from changes in both the manufacturing process and materials it is important not to assumed that the exact results found in the 130nm inspiration document can be identically reproduced on the SKY130 Process Node.

PDK Contents

The SkyWater Open Source PDK contains;

  • Comprehensive documentation around the design rules required to create manufacturable devices on the SKY130 Process Node.
  • EDA tooling support files for multiple open source and proprietary design flows.
  • Primitive cell libraries and models for creating analog designs.
  • Multiple standard digital cell libraries covering a range of different use cases.
  • Multiple documented examples of using the PDK (see below).

For more information see the PDK Contents section of the SkyWater SKY130 PDK.

Using the SkyWater Open Source PDK

The SkyWater Open Source PDK aims to contain comprehensive documentation about using the design kit with multiple tools and design flows to enable many different types of ASIC creation.

We are excited to see additions to this documentation around using this design kit with new tools and design flows. Please see the Contributing file for information on how to do this.

To download or update to the 'latest' version of all standard cell libraries, and to regenerate the liberty files, clone this repository and run the following commands.

# Expect a large download! ~7GB at time of writing.
SUBMODULE_VERSION=latest make submodules -j3 || make submodules -j1

# Regenerate liberty files
make timing

Support

Like many open source projects there are multiple ways to get support on the SkyWater Open Source PDK.

SkyWater has created a Market Partner Ecosystem to be able to provide support from design through back end package and test. If you are interested in getting additional support through the ASIC development process, reach out to SkyWater using the information in the Contacting SkyWater section below.

There is also a users mailing list [join link] to allow like minded users of the PDK to provide support to each other.

Google does not provide external support for using the SkyWater Open Source PDK and is distributing this repository on an "AS IS" BASIS, WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied. See the license section for the full terms.

About SkyWater Technology Foundry

SkyWater is a solely U.S.-based and U.S.-owned, DoD-accredited, Trusted Foundry. Through its Technology Foundry model, SkyWater provides custom design and development services, design IP, and volume manufacturing for integrated circuits and micro devices. The Company’s world-class operations and unique processing capabilities enable mixed-signal CMOS, power, rad-hard and ROIC solutions. SkyWater’s Innovation Engineering Services empower development of superconducting and 3D ICs, along with carbon nanotube, photonic and MEMS devices. SkyWater serves customers in growing markets such as aerospace & defense, automotive, cloud & computing, consumer, industrial, IoT and medical. For more information, please visit: www.skywatertechnology.com/.

SkyWater is building from a long heritage in the microelectronics industry. The SkyWater facility was originally established by Minnesota based Control Data Corporation (CDC) in the 1980s. The CDC fab was acquired by Cypress Semiconductor in 1991. During the Cypress era, the facility was expanded and upgraded multiple times, keeping pace with Moore's Law into the late 2000s and was known for being a US-based production facility that was competitive with Asian-based fabs. SkyWater spun-off from Cypress in 2017 with private equity backing from Minnesota based Oxbow Industries.

Contacting SkyWater

Requests for more information about SKY130 and other standard and customer foundry technologies can be emailed to <swfoundry@skywatertechnology.com> or submitted via this webform.

License

The SkyWater Open Source PDK is released under the Apache 2.0 license.

The copyright details (which should also be found at the top of every file) are;

Copyright 2020 SkyWater PDK Authors

Licensed under the Apache License, Version 2.0 (the "License");
you may not use this file except in compliance with the License.
You may obtain a copy of the License at

    http://www.apache.org/licenses/LICENSE-2.0

Unless required by applicable law or agreed to in writing, software
distributed under the License is distributed on an "AS IS" BASIS,
WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied.
See the License for the specific language governing permissions and
limitations under the License.
Apache License Version 2.0, January 2004 http://www.apache.org/licenses/ TERMS AND CONDITIONS FOR USE, REPRODUCTION, AND DISTRIBUTION 1. Definitions. "License" shall mean the terms and conditions for use, reproduction, and distribution as defined by Sections 1 through 9 of this document. "Licensor" shall mean the copyright owner or entity authorized by the copyright owner that is granting the License. "Legal Entity" shall mean the union of the acting entity and all other entities that control, are controlled by, or are under common control with that entity. For the purposes of this definition, "control" means (i) the power, direct or indirect, to cause the direction or management of such entity, whether by contract or otherwise, or (ii) ownership of fifty percent (50%) or more of the outstanding shares, or (iii) beneficial ownership of such entity. "You" (or "Your") shall mean an individual or Legal Entity exercising permissions granted by this License. "Source" form shall mean the preferred form for making modifications, including but not limited to software source code, documentation source, and configuration files. "Object" form shall mean any form resulting from mechanical transformation or translation of a Source form, including but not limited to compiled object code, generated documentation, and conversions to other media types. "Work" shall mean the work of authorship, whether in Source or Object form, made available under the License, as indicated by a copyright notice that is included in or attached to the work (an example is provided in the Appendix below). "Derivative Works" shall mean any work, whether in Source or Object form, that is based on (or derived from) the Work and for which the editorial revisions, annotations, elaborations, or other modifications represent, as a whole, an original work of authorship. For the purposes of this License, Derivative Works shall not include works that remain separable from, or merely link (or bind by name) to the interfaces of, the Work and Derivative Works thereof. "Contribution" shall mean any work of authorship, including the original version of the Work and any modifications or additions to that Work or Derivative Works thereof, that is intentionally submitted to Licensor for inclusion in the Work by the copyright owner or by an individual or Legal Entity authorized to submit on behalf of the copyright owner. For the purposes of this definition, "submitted" means any form of electronic, verbal, or written communication sent to the Licensor or its representatives, including but not limited to communication on electronic mailing lists, source code control systems, and issue tracking systems that are managed by, or on behalf of, the Licensor for the purpose of discussing and improving the Work, but excluding communication that is conspicuously marked or otherwise designated in writing by the copyright owner as "Not a Contribution." "Contributor" shall mean Licensor and any individual or Legal Entity on behalf of whom a Contribution has been received by Licensor and subsequently incorporated within the Work. 2. Grant of Copyright License. Subject to the terms and conditions of this License, each Contributor hereby grants to You a perpetual, worldwide, non-exclusive, no-charge, royalty-free, irrevocable copyright license to reproduce, prepare Derivative Works of, publicly display, publicly perform, sublicense, and distribute the Work and such Derivative Works in Source or Object form. 3. Grant of Patent License. Subject to the terms and conditions of this License, each Contributor hereby grants to You a perpetual, worldwide, non-exclusive, no-charge, royalty-free, irrevocable (except as stated in this section) patent license to make, have made, use, offer to sell, sell, import, and otherwise transfer the Work, where such license applies only to those patent claims licensable by such Contributor that are necessarily infringed by their Contribution(s) alone or by combination of their Contribution(s) with the Work to which such Contribution(s) was submitted. If You institute patent litigation against any entity (including a cross-claim or counterclaim in a lawsuit) alleging that the Work or a Contribution incorporated within the Work constitutes direct or contributory patent infringement, then any patent licenses granted to You under this License for that Work shall terminate as of the date such litigation is filed. 4. Redistribution. You may reproduce and distribute copies of the Work or Derivative Works thereof in any medium, with or without modifications, and in Source or Object form, provided that You meet the following conditions: (a) You must give any other recipients of the Work or Derivative Works a copy of this License; and (b) You must cause any modified files to carry prominent notices stating that You changed the files; and (c) You must retain, in the Source form of any Derivative Works that You distribute, all copyright, patent, trademark, and attribution notices from the Source form of the Work, excluding those notices that do not pertain to any part of the Derivative Works; and (d) If the Work includes a "NOTICE" text file as part of its distribution, then any Derivative Works that You distribute must include a readable copy of the attribution notices contained within such NOTICE file, excluding those notices that do not pertain to any part of the Derivative Works, in at least one of the following places: within a NOTICE text file distributed as part of the Derivative Works; within the Source form or documentation, if provided along with the Derivative Works; or, within a display generated by the Derivative Works, if and wherever such third-party notices normally appear. The contents of the NOTICE file are for informational purposes only and do not modify the License. You may add Your own attribution notices within Derivative Works that You distribute, alongside or as an addendum to the NOTICE text from the Work, provided that such additional attribution notices cannot be construed as modifying the License. You may add Your own copyright statement to Your modifications and may provide additional or different license terms and conditions for use, reproduction, or distribution of Your modifications, or for any such Derivative Works as a whole, provided Your use, reproduction, and distribution of the Work otherwise complies with the conditions stated in this License. 5. Submission of Contributions. Unless You explicitly state otherwise, any Contribution intentionally submitted for inclusion in the Work by You to the Licensor shall be under the terms and conditions of this License, without any additional terms or conditions. Notwithstanding the above, nothing herein shall supersede or modify the terms of any separate license agreement you may have executed with Licensor regarding such Contributions. 6. Trademarks. This License does not grant permission to use the trade names, trademarks, service marks, or product names of the Licensor, except as required for reasonable and customary use in describing the origin of the Work and reproducing the content of the NOTICE file. 7. Disclaimer of Warranty. Unless required by applicable law or agreed to in writing, Licensor provides the Work (and each Contributor provides its Contributions) on an "AS IS" BASIS, WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied, including, without limitation, any warranties or conditions of TITLE, NON-INFRINGEMENT, MERCHANTABILITY, or FITNESS FOR A PARTICULAR PURPOSE. You are solely responsible for determining the appropriateness of using or redistributing the Work and assume any risks associated with Your exercise of permissions under this License. 8. Limitation of Liability. In no event and under no legal theory, whether in tort (including negligence), contract, or otherwise, unless required by applicable law (such as deliberate and grossly negligent acts) or agreed to in writing, shall any Contributor be liable to You for damages, including any direct, indirect, special, incidental, or consequential damages of any character arising as a result of this License or out of the use or inability to use the Work (including but not limited to damages for loss of goodwill, work stoppage, computer failure or malfunction, or any and all other commercial damages or losses), even if such Contributor has been advised of the possibility of such damages. 9. Accepting Warranty or Additional Liability. While redistributing the Work or Derivative Works thereof, You may choose to offer, and charge a fee for, acceptance of support, warranty, indemnity, or other liability obligations and/or rights consistent with this License. However, in accepting such obligations, You may act only on Your own behalf and on Your sole responsibility, not on behalf of any other Contributor, and only if You agree to indemnify, defend, and hold each Contributor harmless for any liability incurred by, or claims asserted against, such Contributor by reason of your accepting any such warranty or additional liability. END OF TERMS AND CONDITIONS APPENDIX: How to apply the Apache License to your work. To apply the Apache License to your work, attach the following boilerplate notice, with the fields enclosed by brackets "[]" replaced with your own identifying information. (Don't include the brackets!) The text should be enclosed in the appropriate comment syntax for the file format. We also recommend that a file or class name and description of purpose be included on the same "printed page" as the copyright notice for easier identification within third-party archives. Copyright [yyyy] [name of copyright owner] Licensed under the Apache License, Version 2.0 (the "License"); you may not use this file except in compliance with the License. You may obtain a copy of the License at http://www.apache.org/licenses/LICENSE-2.0 Unless required by applicable law or agreed to in writing, software distributed under the License is distributed on an "AS IS" BASIS, WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied. See the License for the specific language governing permissions and limitations under the License.

简介

Clone of https://github.com/google/skywater-pdk 展开 收起
Python 等 3 种语言
Apache-2.0
取消

发行版

暂无发行版

贡献者

全部

近期动态

加载更多
不能加载更多了
马建仓 AI 助手
尝试更多
代码解读
代码找茬
代码优化